Compositional determination of oxygen-exposed Co/Ge(1 1 1) film: Surfactant effect

C. W. Lai; Y. L. Chiou; H. W. Chang; W. Y. Chan; K. J. Hwang; J. S. Tsay; Y. D. Yao

doi:10.1016/j.jmmm.2006.01.183

Compositional determination of oxygen-exposed Co/Ge(1 1 1) film: Surfactant effect

C. W. Lai^*
, Y. L. Chiou
, H. W. Chang
, W. Y. Chan
, K. J. Hwang
, J. S. Tsay
, Y. D. Yao

^*此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

2 引文斯高帕斯（Scopus）

摘要

We apply the Monte Carlo simulation with Auger sputtering depth profiling to quantitatively determine the distribution of oxygen in the film O/Co/Ge(1 1 1). The well fitting curves of experimental data and simulation reveal a crucial fact that oxygen is highly mobile, has strong tendency to float out to the surface during subsequent oxygen exposure and cobalt deposition, and behaves as surfactant in this system. The simulation results show that full oxygen should be on the topmost layer, 88-90% oxygen is in the second layer, 77-80% oxygen is in third layer, and 57-60% oxygen is in fourth layer of the O/Co/Ge(1 1 1) system.

原文	英語
頁（從 - 到）	e75-e77
期刊	Journal of Magnetism and Magnetic Materials
卷	304
發行號	1
DOIs	https://doi.org/10.1016/j.jmmm.2006.01.183
出版狀態	已發佈 - 2006 9月
對外發佈	是

ASJC Scopus subject areas

電子、光磁材料
凝聚態物理學

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10.1016/j.jmmm.2006.01.183

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@article{df824f0a6dda42268d84f472c51bf53c,

title = "Compositional determination of oxygen-exposed Co/Ge(1 1 1) film: Surfactant effect",

abstract = "We apply the Monte Carlo simulation with Auger sputtering depth profiling to quantitatively determine the distribution of oxygen in the film O/Co/Ge(1 1 1). The well fitting curves of experimental data and simulation reveal a crucial fact that oxygen is highly mobile, has strong tendency to float out to the surface during subsequent oxygen exposure and cobalt deposition, and behaves as surfactant in this system. The simulation results show that full oxygen should be on the topmost layer, 88-90\% oxygen is in the second layer, 77-80\% oxygen is in third layer, and 57-60\% oxygen is in fourth layer of the O/Co/Ge(1 1 1) system.",

keywords = "Auger electron spectroscopy, Depth profiling, Monte Carlo simulation, Surfactant",

author = "Lai, \{C. W.\} and Chiou, \{Y. L.\} and Chang, \{H. W.\} and Chan, \{W. Y.\} and Hwang, \{K. J.\} and Tsay, \{J. S.\} and Yao, \{Y. D.\}",

note = "Funding Information: Authors acknowledge support from the National Science Council of ROC with contract No. NSC94-2120-M-001-004. ",

year = "2006",

month = sep,

doi = "10.1016/j.jmmm.2006.01.183",

language = "English",

volume = "304",

pages = "e75--e77",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

publisher = "Elsevier BV",

number = "1",

}

TY - JOUR

T1 - Compositional determination of oxygen-exposed Co/Ge(1 1 1) film

T2 - Surfactant effect

AU - Lai, C. W.

AU - Chiou, Y. L.

AU - Chang, H. W.

AU - Chan, W. Y.

AU - Hwang, K. J.

AU - Tsay, J. S.

AU - Yao, Y. D.

N1 - Funding Information: Authors acknowledge support from the National Science Council of ROC with contract No. NSC94-2120-M-001-004.

PY - 2006/9

Y1 - 2006/9

N2 - We apply the Monte Carlo simulation with Auger sputtering depth profiling to quantitatively determine the distribution of oxygen in the film O/Co/Ge(1 1 1). The well fitting curves of experimental data and simulation reveal a crucial fact that oxygen is highly mobile, has strong tendency to float out to the surface during subsequent oxygen exposure and cobalt deposition, and behaves as surfactant in this system. The simulation results show that full oxygen should be on the topmost layer, 88-90% oxygen is in the second layer, 77-80% oxygen is in third layer, and 57-60% oxygen is in fourth layer of the O/Co/Ge(1 1 1) system.

AB - We apply the Monte Carlo simulation with Auger sputtering depth profiling to quantitatively determine the distribution of oxygen in the film O/Co/Ge(1 1 1). The well fitting curves of experimental data and simulation reveal a crucial fact that oxygen is highly mobile, has strong tendency to float out to the surface during subsequent oxygen exposure and cobalt deposition, and behaves as surfactant in this system. The simulation results show that full oxygen should be on the topmost layer, 88-90% oxygen is in the second layer, 77-80% oxygen is in third layer, and 57-60% oxygen is in fourth layer of the O/Co/Ge(1 1 1) system.

KW - Auger electron spectroscopy

KW - Depth profiling

KW - Monte Carlo simulation

KW - Surfactant

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UR - https://www.scopus.com/pages/publications/33744498664#tab=citedBy

U2 - 10.1016/j.jmmm.2006.01.183

DO - 10.1016/j.jmmm.2006.01.183

M3 - Article

AN - SCOPUS:33744498664

SN - 0304-8853

VL - 304

SP - e75-e77

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - 1

ER -

Compositional determination of oxygen-exposed Co/Ge(1 1 1) film: Surfactant effect

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