TY - JOUR
T1 - Comparison of magnetic properties of ultrathin Co/Si(1 1 1) and Co/Ag/Si(1 1 1) films
AU - Tsay, J. S.
AU - Yao, Y. D.
AU - Liou, Y.
AU - Lee, S. F.
AU - Yang, C. S.
N1 - Funding Information:
This work was supported by the National Science Council of ROC under Grant No. NSC 88-2112-M-001-038.
PY - 2000/2
Y1 - 2000/2
N2 - The thermal stability of the magnetization of the Co/Ag/Si(1 1 1) film is lower than that of the Co/Si(1 1 1) film. From Auger electron spectroscopy, we demonstrate that Ag atoms in the Co/Ag/Si(1 1 1) film segregate to top layers below 350 K. The segregation of Ag atoms improves the diffusion of Co into Si(1 1 1) substrate. Annealing 10.5 ML Co/Si(1 1 1) film causes the easy axis of magnetization to transform from an in-plane to a cant out-of-plane. The in-plane magnetization of 10.5 ML in Co/Ag/Si(1 1 1) film persists after annealing.
AB - The thermal stability of the magnetization of the Co/Ag/Si(1 1 1) film is lower than that of the Co/Si(1 1 1) film. From Auger electron spectroscopy, we demonstrate that Ag atoms in the Co/Ag/Si(1 1 1) film segregate to top layers below 350 K. The segregation of Ag atoms improves the diffusion of Co into Si(1 1 1) substrate. Annealing 10.5 ML Co/Si(1 1 1) film causes the easy axis of magnetization to transform from an in-plane to a cant out-of-plane. The in-plane magnetization of 10.5 ML in Co/Ag/Si(1 1 1) film persists after annealing.
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U2 - 10.1016/S0304-8853(99)00689-7
DO - 10.1016/S0304-8853(99)00689-7
M3 - Conference article
AN - SCOPUS:0034135423
SN - 0304-8853
VL - 209
SP - 208
EP - 210
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
IS - 1-3
T2 - Proceedings of the 1999 International Symposium on Advanced Magnetic Technologies (ISAMT'99)
Y2 - 24 May 1999 through 25 May 1999
ER -