Comparison of magnetic properties of ultrathin Co/Si(1 1 1) and Co/Ag/Si(1 1 1) films

J. S. Tsay, Y. D. Yao, Y. Liou, S. F. Lee, C. S. Yang

研究成果: 雜誌貢獻會議論文同行評審

6 引文 斯高帕斯(Scopus)

摘要

The thermal stability of the magnetization of the Co/Ag/Si(1 1 1) film is lower than that of the Co/Si(1 1 1) film. From Auger electron spectroscopy, we demonstrate that Ag atoms in the Co/Ag/Si(1 1 1) film segregate to top layers below 350 K. The segregation of Ag atoms improves the diffusion of Co into Si(1 1 1) substrate. Annealing 10.5 ML Co/Si(1 1 1) film causes the easy axis of magnetization to transform from an in-plane to a cant out-of-plane. The in-plane magnetization of 10.5 ML in Co/Ag/Si(1 1 1) film persists after annealing.

原文英語
頁(從 - 到)208-210
頁數3
期刊Journal of Magnetism and Magnetic Materials
209
發行號1-3
DOIs
出版狀態已發佈 - 2000 二月
事件Proceedings of the 1999 International Symposium on Advanced Magnetic Technologies (ISAMT'99) - Taipei, Taiwan
持續時間: 1999 五月 241999 五月 25

ASJC Scopus subject areas

  • 電子、光磁材料
  • 凝聚態物理學

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