Comparative studies of magnetic properties of Co films on annealed and unannealed rubrene/Si(100)

Chih Yu Hsu, Cheng Hsun Tony Chang, Wei Hsiang Chen, Jai Lin Tsai, Jyh Shen Tsay*

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

8 引文 斯高帕斯(Scopus)

摘要

Structures and magnetic properties of Co films on rubrene/Si(100) have been investigated by employing atomic force microscopy, X-ray diffraction and magneto-optic Kerr effect techniques. For Co/rubrene/Si(100) films, separated Co clusters are found as the Co thickness increases. For 20 nm Co overlayer, the Co clusters are uniform with an average diameter around 90 nm. After annealing treatments at 550 K for rubrene/Si(100), rubrene molecules nucleate to form clusters and pinholes develop in the rubrene layer. For Co/annealed rubrene/Si(100) films, the formation of a Co/Si(100) interface is important for the occurrence of the pyramid-like nanostructure with an hcp stacking of the Co layer. Comparative studies of thickness dependencies of the magnetic properties for x nm Co on rubrene/Si(100) prepared at 300 and 550 K have been performed. With increasing the cobalt thickness, the Kerr intensities approach a saturation value for thicker Co due to an attenuation of the laser intensity in a condensed material. For Co deposited on annealed rubrene/Si(100), the enhancement of the coercive force is attributed to the imperfection introduced by rough interface to impede the magnetization reversal. As the Co thickness increases from 10 to 40 nm on rubrene/Si(100), the squareness increases from 0.9 to near unity. For Co deposited on annealed rubrene/Si(100), the squareness of magnetization curve is close to unity for all the Co thicknesses. The formation of Co islands in triangular shapes plays an important role on the enhancement of the squareness of magnetization curve for Co overlayers.

原文英語
頁(從 - 到)393-397
頁數5
期刊Journal of Alloys and Compounds
576
DOIs
出版狀態已發佈 - 2013

ASJC Scopus subject areas

  • 材料力學
  • 機械工業
  • 金屬和合金
  • 材料化學

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