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Chiral anomaly and Weyl orbit in three-dimensional Dirac semimetal Cd3As2 grown on Si

  • Wei Chen Lin
  • , Peng Ying Tsai
  • , Jia Zhu Zou
  • , Jie Ying Lee
  • , Chun Wei Kuo
  • , Hsin Hsuan Lee
  • , Ching Yang Pan
  • , Cheng Hsueh Yang
  • , Sheng Zong Chen
  • , Jyh Shyang Wang
  • , Pei Hsun Jiang
  • , Chi Te Liang*
  • , Chiashain Chuang
  • *此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

4   連結會在新分頁中打開 引文 斯高帕斯(Scopus)

摘要

Preparing Cd3As2, which is a three-dimensional (3D) Dirac semimetal in certain crystal orientation, on Si is highly desirable as such a sample may well be fully compatible with existing Si CMOS technology. However, there is a dearth of such a study regarding Cd3As2 films grown on Si showing the chiral anomaly. Here, for the first time, we report the novel preparation and fabrication technique of a Cd3As2 (112) film on a Si (111) substrate with a ZnTe (111) buffer layer which explicitly shows the chiral anomaly with a nontrivial Berry’s phase of π. Despite the Hall carrier density ( n 3 D ≈ 9.42 × 10 17 cm−3) of our Cd3As2 film, which is almost beyond the limit for the portents of a 3D Dirac semimetal to emerge, we observe large linear magnetoresistance in a perpendicular magnetic field and negative magnetoresistance in a parallel magnetic field. These results clearly demonstrate the chiral magnetic effect and 3D Dirac semimetallic behavior in our silicon-based Cd3As2 film. Our tailoring growth of Cd3As2 on a conventional substrate such as Si keeps the sample quality, while also achieving a low carrier concentration.

原文英語
文章編號165002
期刊Nanotechnology
35
發行號16
DOIs
出版狀態已發佈 - 2024 4月 15

ASJC Scopus subject areas

  • 生物工程
  • 一般化學
  • 一般材料科學
  • 材料力學
  • 機械工業
  • 電氣與電子工程

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