Characteristics of strained-germanium p- and n-channel field effect transistors on a Si (1 1 1) substrate

S. Maikap*, M. H. Lee, S. T. Chang, C. W. Liu

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

25 引文 斯高帕斯(Scopus)

摘要

Characteristics of strained-germanium (Ge) p- and n-channel field effect transistors directly on Si (1 1 1) substrates have been investigated. A strained-Ge layer with a thickness of ∼4 nm has been grown on the relaxed Si/Si (1 1 1) substrate by ultra-high-vacuum chemical vapour deposition. To improve the oxide/strained-Ge interface, a thin Si-cap layer with a thickness of 3 nm has been grown on the strained-Ge layer. After the device process, 1 nm thickness of Si-cap layer remains on the strained-Ge layer. Thicknesses of all epitaxial layers have been measured by transmission electron microscopy. Raman spectroscopy measurement on the Si-cap/strained-Ge layer shows that the strained-Ge layer has a compressive strain of ∼1.25%. A hole confinement shoulder on the capacitance-voltage curve at the accumulation region has been observed due to carrier confinement at the Si-cap/strained-Ge hetero-interface. A metal-oxide-semiconductor (MOS) structure on the strained-Ge layer shows a moderate interface trap charge density of ∼2.8 × 1011 cm-2 eV-1. Strained-Ge p- and n-channel field effect transistors show low off-state leakage currents of ∼3.8 × 10 -13 A νm-1 and ∼6.5 × 10-13 A νm-1, respectively. Drive currents of strained-Ge p- and n-channel field effect transistors are enhanced by ∼100% and ∼40%, respectively, as compared with bulk Si (1 1 1) transistors. Peak hole and electron mobility of strained-Ge (1 1 1) field effect transistors at the low effective field are found to be ∼110% and ∼30% enhancement, respectively, as compared with bulk Si (1 1 1) transistors, due to high hole and electron mobility enhancement factor as well as strain-induced lower conduction mass in the strained-Ge channel.

原文英語
文章編號008
頁(從 - 到)342-347
頁數6
期刊Semiconductor Science and Technology
22
發行號4
DOIs
出版狀態已發佈 - 2007 四月 1

ASJC Scopus subject areas

  • 電子、光磁材料
  • 凝聚態物理學
  • 電氣與電子工程
  • 材料化學

指紋

深入研究「Characteristics of strained-germanium p- and n-channel field effect transistors on a Si (1 1 1) substrate」主題。共同形成了獨特的指紋。

引用此