摘要
In this article, we describe our successful fabrication of a Ce O 2 metal-insulator-metal (MIM) capacitor with a low voltage nonlinearity. A low leakage current of 3.9× 10-7 A/ cm 2 at -1 V and a small VCC-α∼421 ppm/ V 2 were obtained at a high 10.8 fF/μ m2 density for a Pt/Ce O2 /TaN MIM capacitor. The small VCC-α for a 15 nm thick Ce O2 dielectric (κ∼20) was much better than the reported dielectrics of Hf O2, Tb-Hf O2, and Al2 O 3 -Hf O2 at a similar κ -value (15-20). The good analog performance was due to the combined effect of the Ce O2 dielectric and the high work-function metals.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | H16-H19 |
| 期刊 | Electrochemical and Solid-State Letters |
| 卷 | 13 |
| 發行號 | 1 |
| DOIs | |
| 出版狀態 | 已發佈 - 2009 |
| 對外發佈 | 是 |
ASJC Scopus subject areas
- 一般化學工程
- 一般材料科學
- 物理與理論化學
- 電化學
- 電氣與電子工程
指紋
深入研究「Characteristics of cerium oxide for metal-insulator-metal capacitors」主題。共同形成了獨特的指紋。引用此
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