Characteristics and hot-carrier effects of strained pMOSFETs with SiGe channel and embedded SiGe source/drain stressors

Mu Chun Wang, Shea Jue Wang*, Heng Sheng Huang, Shuang Yuan Chen, Min Ru Peng, Liang Ru Ji, Ming Feng Lu, Wen Shiang Liao, Chuan Hsi Liu

*此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

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