Channel modification engineering by plasma processing in tin-oxide thin film transistor: Experimental results and first-principles calculation

Y. C. Chiu, P. C. Chen, S. L. Chang, Z. W. Zheng, C. H. Cheng, G. L. Liou, H. L. Kao, Y. H. Wu, C. Y. Chang

研究成果: 雜誌貢獻期刊論文同行評審

4 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds