Channel modification engineering by plasma processing in tin-oxide thin film transistor: Experimental results and first-principles calculation
Y. C. Chiu, P. C. Chen, S. L. Chang, Z. W. Zheng, C. H. Cheng, G. L. Liou, H. L. Kao, Y. H. Wu, C. Y. Chang
研究成果: 雜誌貢獻 › 期刊論文 › 同行評審
4
引文
斯高帕斯（Scopus）