摘要
Large area polycrystalline diamond films up to 3 inches in diameter were synthesized on p-type silicon (100) substrate by microwave plasma chemical vapor deposition (MPCVD) using a bias enhanced growth (BEG) technique. Scanning electron microscopy (SEM) reveals half-spherical, amorphous crystalline diamonds of ballas shape were deposited under no bias. Diamond (100) faceted film can be produced at -250 V bias. When the negative bias was increased to -450 V, only (111) faceted faces was produced. Raman spectra obtained using both 514 and 633 nm lasers were analyzed to reveal detailed structure of the diamond films. At -250 V bias, optimal diamond growths were found from Raman spectral analysis. The analysis of C1S XPS spectrum indicated the large ratio of sp3/s2p at -250 V implying carbon atoms would have more chance to connect into sp3 carbon phase of diamond.
原文 | 英語 |
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頁(從 - 到) | 26-32 |
頁數 | 7 |
期刊 | Diamond and Related Materials |
卷 | 12 |
發行號 | 1 |
DOIs | |
出版狀態 | 已發佈 - 2003 1月 |
ASJC Scopus subject areas
- 電子、光磁材料
- 一般化學
- 機械工業
- 材料化學
- 電氣與電子工程