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Atomic-scale determination of band offsets at the Gd2O 3/GaAs (100) hetero-interface using scanning tunneling spectroscopy

  • Y. P. Chiu*
  • , B. C. Huang
  • , M. C. Shih
  • , J. Y. Shen
  • , P. Chang
  • , C. S. Chang
  • , M. L. Huang
  • , M. H. Tsai
  • , M. Hong
  • , J. Kwo
  • *此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

10   連結會在新分頁中打開 引文 斯高帕斯(Scopus)

摘要

Direct measurements of band profile and band offsets across the Gd 2O3/GaAs(100) hetero-interface have been performed using cross-sectional scanning tunneling microscopy and spectroscopy. The spatial variation of the local density of states with atomic precision revealed the interfacial band alignment in this model high-/III-V system. In conjunction with the theoretical modeling, the band offsets for both conduction and valence states are identified, revealing critical information about the electrostatic potential landscape of the GaAs semiconductor transistor with a Gd 2O3 gate dielectric.

原文英語
文章編號212101
期刊Applied Physics Letters
卷99
發行號21
DOIs
出版狀態已發佈 - 2011 11月 21
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ASJC Scopus subject areas

  • 物理與天文學(雜項)

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