摘要
Direct measurements of band profile and band offsets across the Gd 2O3/GaAs(100) hetero-interface have been performed using cross-sectional scanning tunneling microscopy and spectroscopy. The spatial variation of the local density of states with atomic precision revealed the interfacial band alignment in this model high-/III-V system. In conjunction with the theoretical modeling, the band offsets for both conduction and valence states are identified, revealing critical information about the electrostatic potential landscape of the GaAs semiconductor transistor with a Gd 2O3 gate dielectric.
| 原文 | 英語 |
|---|---|
| 文章編號 | 212101 |
| 期刊 | Applied Physics Letters |
| 卷 | 99 |
| 發行號 | 21 |
| DOIs | |
| 出版狀態 | 已發佈 - 2011 11月 21 |
| 對外發佈 | 是 |
ASJC Scopus subject areas
- 物理與天文學(雜項)
指紋
深入研究「Atomic-scale determination of band offsets at the Gd2O 3/GaAs (100) hetero-interface using scanning tunneling spectroscopy」主題。共同形成了獨特的指紋。引用此
- APA
- Standard
- Harvard
- Vancouver
- Author
- BIBTEX
- RIS