TY - JOUR
T1 - Atomic processes in self-diffusion of Ni surfaces
AU - Fu, Tsu Yi
AU - Tsong, Tien T.
PY - 2000/5/20
Y1 - 2000/5/20
N2 - Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.
AB - Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.
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U2 - 10.1016/S0039-6028(00)00095-9
DO - 10.1016/S0039-6028(00)00095-9
M3 - Conference article
AN - SCOPUS:0033691236
VL - 454
SP - 571
EP - 574
JO - Surface Science
JF - Surface Science
SN - 0039-6028
IS - 1
T2 - ECOSS-18: 18th European Conference on Surface Science
Y2 - 21 September 1999 through 24 September 1999
ER -