Atomic processes in self-diffusion of Ni surfaces

Tsu-Yi Fu, Tien T. Tsong

研究成果: 雜誌貢獻會議論文同行評審

28 引文 斯高帕斯(Scopus)

摘要

Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.

原文英語
頁(從 - 到)571-574
頁數4
期刊Surface Science
454
發行號1
DOIs
出版狀態已發佈 - 2000 五月 20
事件ECOSS-18: 18th European Conference on Surface Science - Vienna, Austria
持續時間: 1999 九月 211999 九月 24

ASJC Scopus subject areas

  • 凝聚態物理學
  • 表面和介面
  • 表面、塗料和薄膜
  • 材料化學

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