Atomic Layer Deposition Plasma-Based Undoped-HfO2Ferroelectric FETs for Non-Volatile Memory

Jun Dao Luo, Yu Ying Lai, Kuo Yu Hsiang, Chia Feng Wu, Hao Tung Chung, Wei Shuo Li, Chun Yu Liao, Pin Guang Chen, Kuan Neng Chen, Min Hung Lee*, Huang Chung Cheng

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

5 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds