摘要
Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 Å per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 2335-2336 |
| 頁數 | 2 |
| 期刊 | Physica B: Physics of Condensed Matter |
| 卷 | 194-196 |
| 發行號 | PART 2 |
| DOIs | |
| 出版狀態 | 已發佈 - 1994 2月 2 |
ASJC Scopus subject areas
- 電子、光磁材料
- 凝聚態物理學
- 電氣與電子工程
指紋
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