Applying Grayscale Digital Masks and Defocusing Method to Digital Light Processing Stereolithography for Rapid Manufacture of Microlens Arrays

Chih Yu Hsieh*, Pin Chuan Chen, Pai Shan Chen, Yi Hsin Liu

*此作品的通信作者

研究成果: 書貢獻/報告類型會議論文篇章

摘要

Grayscale digital masks and defocusing method were applied to digital light processing (DLP) stereolithography (SLA) 3D printing for the fabrication of various types of microlens arrays (MLAs) within 1 second. MLAs with high numerical aperture (NA) up to 0.98, MLAs with multiple focal lengths (21 ~ 199 μm) on a single substrate, MLAs with high fill factor of 77.98%, and aspherical MLAs were successfully demonstrated. Experiment results also clearly demonstrated that defocusing method efficiently reduced the surface roughness (Sa) of the MLAs to 52 nm and led to an image resolution up to 45.3 lp/mm.

原文英語
主出版物標題2023 22nd International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers 2023
發行者Institute of Electrical and Electronics Engineers Inc.
頁面225-228
頁數4
ISBN(電子)9784886864352
出版狀態已發佈 - 2023
事件22nd International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers 2023 - Kyoto, 日本
持續時間: 2023 6月 252023 6月 29

出版系列

名字2023 22nd International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers 2023

會議

會議22nd International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers 2023
國家/地區日本
城市Kyoto
期間2023/06/252023/06/29

ASJC Scopus subject areas

  • 電腦科學應用
  • 電氣與電子工程
  • 控制和優化
  • 儀器

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