摘要
The adsorption and reaction of H2S on a Si(100) surface were investigated using density functional theory (DFT) and X-ray photoelectron spectra (XPS). The decomposition of H2S results in the formation of S adatoms via a HS species. We propose four reaction paths for the decomposition of adsorbed H2S; the corresponding structural conformations of H 2S, HS, and S species are presented. The density of states and electron density difference were utilized to illustrate the interaction between S-containing species and surface Si atoms. The interaction of the surface Si atom and the H atom of H2S facilitates the decomposition of adsorbed H2S. The assignments of XPS data are correlated with the proposed intermediates during the thermal decomposition of H2S.
原文 | 英語 |
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頁(從 - 到) | 19203-19209 |
頁數 | 7 |
期刊 | Journal of Physical Chemistry C |
卷 | 115 |
發行號 | 39 |
DOIs | |
出版狀態 | 已發佈 - 2011 10月 6 |
ASJC Scopus subject areas
- 電子、光磁材料
- 能源(全部)
- 物理與理論化學
- 表面、塗料和薄膜