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Antiferroelectric-Based Memcapacitor and Strategy for Non-Destructive Read Operation by Endurance Recovery

  • C. H. Liu
  • , K. Y. Hsiang
  • , F. S. Chang
  • , M. Januar
  • , Y. T. Chang
  • , C. W. Liu
  • , T. H. Hou
  • , M. H. Lee*
  • *此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

摘要

The proposed antiferroelectric capacitive memory (AFE-FCM) achieves a symmetric capacitive memory window (CMW) of ∼ 6× ϵ0 with non-destructive readout (NDR) at 0V. The asymmetric capacitance loop (ACL) operation achieves CMW with reduced drive voltage range -1.5V to + 3V or -3V to + 1.5V. The sensing circuit of FCM verifies a significant improvement in sensing voltage for AFE compared to FE. The read endurance with NDR remains beyond 109 cycling. The NDR characteristic gradually transitions to destructive readout (DR) due to the program/erase endurance, which accumulates the imprint effect. The strategy will be proposed to eliminate DR and prolong endurance through a recovery scheme, with a 100-period demonstration. The proposed AFE-FCM boasts promising metrics, including high CMW, NDR, long endurance, a crossbar architecture, a simple structure, and treatment-free capabilities.

原文英語
頁(從 - 到)1101-1104
頁數4
期刊IEEE Electron Device Letters
47
發行號6
DOIs
出版狀態已發佈 - 2026 6月 1
對外發佈

ASJC Scopus subject areas

  • 電子、光磁材料
  • 電氣與電子工程

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