Analysis and modeling of nano-crystalline silicon TFTs on flexible substrate with mechanical strain

M. H. Lee, S. T. Chang, J. J. Huang, G. R. Hu, Y. S. Huang, C. C. Lee

研究成果: 書貢獻/報告類型會議論文篇章

摘要

The gap state density of nano-crystalline silicon active layer on flexible substrate will be redistributed with mechanical bending. The weak or broken bonds may contribute to the redistribution of trap states. During mechanical strain the deep states are redistributed in a Gaussian distribution, and are dissimilar to ordinary acceptor-like deep states which manifest with exponential distributions. We conclude that the DOS with TCAD modeling under mechanical strain is the fundamental reliability issue for the development of flexible electronics.

原文英語
主出版物標題INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
頁面654-655
頁數2
DOIs
出版狀態已發佈 - 2010
事件2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, 中国
持續時間: 2010 1月 32010 1月 8

出版系列

名字INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

其他

其他2010 3rd International Nanoelectronics Conference, INEC 2010
國家/地區中国
城市Hongkong
期間2010/01/032010/01/08

ASJC Scopus subject areas

  • 電氣與電子工程

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