Adsorption and reaction of N2H4 on Si(1 0 0)-2 × 1: A computational study with single- and double-dimer cluster models

Jeng Han Wang, M. C. Lin*

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

7 引文 斯高帕斯(Scopus)

摘要

We have studied the adsorption and decomposition of N2H 4 on Si(1 0 0)-2 × 1 surface using the hybrid density functional B3LYP method with Si9H12 and Si 15H16 as single and double surface dimer models for cluster calculations, respectively. We also compared the energetic results with slab calculations using density functional theory with the generalized gradient approximation. The result of our single-dimer surface model calculation shows that the activation energy for the dissociative adsorption of N 2H4 producing 2NH2(a), 29.6 kcal/mol, is higher than that for the dissociative adsorption giving N2H3(a) + H(a), 5.3 kcal/mol although the overall exothermicity of the former process, 97 kcal/mol, is considerably higher than that of the latter, 56 kcal/mol. Both processes occur via the stable N2H4(a) intermediate formed with 23.7 kcal/mol adsorption energy. The result of our calculation with the double-dimer surface model reveals that the activation energies for the aforementioned processes are somewhat lower than the single-dimer surface for either one or two N2H4 molecules, but with a similar trend. The energies of stable species predicted by the slab model calculation are consistent with the double-dimer results to within 10%. The predicted stabilities of various surface species and their vibrational frequencies are also consistent with the results of our previous thermal annealing studies with HREELS, XPS and UPS measurements. With the double-dimer surface model, we have also examined the effect of adsorbate interactions.

原文英語
頁(從 - 到)197-214
頁數18
期刊Surface Science
579
發行號2-3
DOIs
出版狀態已發佈 - 2005 四月 1

ASJC Scopus subject areas

  • 凝聚態物理學
  • 表面和介面
  • 表面、塗料和薄膜
  • 材料化學

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