A special connection between nanofabrication and analytical devices: Chemical lift-off lithography

Chemical lift-off lithography (CLL) is a chemo-topographical nanopatterning technique developed in 2012 which provides not only precise geometry control with sub-20 nm resolution, but also sharp material interface environment adjustments. Unlike most fabrication techniques, this approach builds a straightforward bridge between structure generation and analytical device designs. This property lies on a direct molecular pattern creation on a metal surface, where the produced unique interface environment acts as a supporting matrix for diverse analytical tools. Operation of CLL includes stamp activation, self-assembled monolayer formation, conformal sealing, and finally interface molecule lift-off. Creation of molecular patterns is achieved by using stamps casting with structures, and a featureless master generates active surfaces capable of arbitrary functionalization. The post lift-off areas present an environment distributed with residual molecules, and its composition can be well-tuned by interface reaction conditions and monolayer selection. Connections between CLL and analytical devices initiate from this point, where tools such as functional probe anchoring, microscopy, high-throughput microfluidics, and spectroscopy can all be integrated. This paper outlines the ideas behind CLL and connections to analytical devices, where invention background introduction, unique molecular environment discussion, modern platform demonstration, challenges in the future, and exciting perspective work in coming years are all included.