A novel illuminator design in a rapid thermal processor

Min Hung Lee, Chee Wee Liu

研究成果: 雜誌貢獻文章

6 引文 斯高帕斯(Scopus)

摘要

The instantaneous insertion of an opaque shutter between the lamp arrays and the wafer in a rapid thermal processor can significantly increase the ramp-down rate from 90 to 400 °C/s during the cooling period. This shutter can prevent the residual heating of lamp filament as well as the self-heating from the reflector due to the mirror image of the wafer. To compensate for the weak irradiation intensity close to the edge of the linear lamps, a multiplane reflector design is used to increase the uniformity of irradiation intensity in the direction along the linear lamps. The distance between the reflector plane and the linear lamp is designed to be smaller at the edge, as compared to the center, of the linear lamp. Together with two oblique reflectors at the ends of the linear lamps, a typical three-plane reflector design can increase the uniformity by 60% in a typical lamp configuration.

原文英語
頁(從 - 到)152-156
頁數5
期刊IEEE Transactions on Semiconductor Manufacturing
14
發行號2
DOIs
出版狀態已發佈 - 2001 五月 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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