摘要
In this letter, a dual-band class-E CMOS power amplifier (PA) in 0.18-μm CMOS process is presented. By using concurrent dual-band impedance matching network, the proposed dual-band PA can achieve high efficiency in a compact chip area. This dual-band class-E PA demonstrates the power gain ≥ 8.4 dB, Psat ≥ 21.4 dBm with power added efficiency ≥ 31% in a compact chip size of 0.5 mm2. This dual-band class-E PA achieves comparable power area density of 284.5 (mW/mm2) with other state-of-the-art class-E PAs at higher frequency.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 1672-1675 |
| 頁數 | 4 |
| 期刊 | Microwave and Optical Technology Letters |
| 卷 | 60 |
| 發行號 | 7 |
| DOIs | |
| 出版狀態 | 已發佈 - 2018 7月 |
ASJC Scopus subject areas
- 電子、光磁材料
- 原子與分子物理與光學
- 凝聚態物理學
- 電氣與電子工程
指紋
深入研究「A dual-band class-E power amplifier with concurrent matching network in 0.18-μm CMOS」主題。共同形成了獨特的指紋。引用此
- APA
- Standard
- Harvard
- Vancouver
- Author
- BIBTEX
- RIS