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查看斯高帕斯 (Scopus) 概要
盧 志權
副教授
物理學系
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ntnu.edu
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h-index
289
引文
10
h-指數
按照存儲在普爾(Pure)的出版物數量及斯高帕斯(Scopus)引文計算。
1996
2014
每年研究成果
概覽
指紋
網路
研究成果
(60)
類似的個人檔案
(3)
指紋
查看啟用 Chi-Kuen Lo 的研究主題。這些主題標籤來自此人的作品。共同形成了獨特的指紋。
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重量
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INIS
layers
100%
films
70%
anisotropy
50%
spin
46%
permalloy
45%
epitaxy
43%
magnesium oxides
39%
transistors
38%
magnetization
38%
impedance
35%
magnetoresistance
33%
valves
32%
thickness
31%
buffers
29%
junctions
28%
electron beams
27%
temperature range 0273-0400 k
26%
annealing
23%
hysteresis
20%
fcc lattices
19%
magnetic properties
18%
mhz range
17%
evaporation
16%
shape
15%
metals
14%
surfaces
14%
kerr effect
13%
substrates
13%
nanostructures
12%
osmium
12%
barriers
11%
nickel oxides
10%
randomness
10%
tunneling
10%
stability
9%
equivalent circuits
9%
magnetic fields
8%
capacitance
8%
voltage
8%
orientation
8%
molybdenum 100
8%
growth
8%
cobalt
8%
topography
8%
x-ray diffraction
8%
peaks
8%
crystal defects
8%
magnetic tunnel junctions
7%
thin films
7%
symmetry
7%
Physics
Room Temperature
37%
Anisotropy
32%
Evaporation
29%
Magnetization
27%
Ratios
26%
Spin
21%
Spin Valve
21%
Transistor
19%
Magnetic Properties
17%
Kerr Effect
16%
Coercivity
15%
Plane
14%
Impedance
14%
Spectrometer
14%
Behavior
12%
Silicon
12%
Ferromagnetic Resonance
12%
Exchange Bias
12%
Temperature
11%
Hysteresis
11%
Surface Properties
10%
Substrates
10%
High Resolution
9%
Oxide
9%
Diffraction
9%
Frequencies
9%
Magnetic Anisotropy
8%
Cobalt
8%
Wafer
8%
Memory
7%
Annealing
7%
Molecular Beam Epitaxy
7%
Electrical Resistivity
7%
Oxygen
6%
Exponents
6%
Nickel
6%
Eddy
6%
Statics
6%
Meander
6%
Anisotropic Magnetoresistance
6%
Transport Properties
6%
Numerical Analysis
6%
X Ray Spectroscopy
6%
Ion
6%
Photoelectric Emission
6%
Roughness
6%
Networks
6%
Surface Roughness
6%
Domain Wall
6%
Electron Scattering
6%
Material Science
Temperature
53%
Anisotropy
48%
Transistor
38%
Magnesium Oxide
37%
Permalloy
25%
Film
21%
Oxide
19%
Giant Magnetoresistance
18%
Magnetoresistance
17%
Epitaxial Layer
12%
Domain Wall
12%
Nickel
12%
Silicon
12%
Electronic Circuit
12%
Buffer Layer
11%
Capacitance
11%
Glass
9%
Durability
9%
Thermal Stability
9%
Characterization
8%
Devices
8%
Metal
8%
Molecular Beam Epitaxy
7%
Saturation
7%
Magnetron Sputtering
7%
Material
6%
Electrical Resistivity
6%
Oxide Film
6%
Surface Topography
6%
Secondary Ion Mass Spectrometry
6%
Electrodeposition
6%
ZnO
6%
Sputtered Film
6%
Cobalt
6%
Lattice Mismatch
6%
Osmium
6%
Lithography
6%
Film Thickness
5%