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機電工程學系
國立臺灣師範大學
科技與工程學院
郵寄地址
臺灣
概覽
指紋
網路
個人檔案
(15)
研究計畫
(68)
研究成果
(700)
資料集
(9)
新聞/媒體
(3)
指紋
查看啟用 機電工程學系 的研究主題。這些主題標籤來自此機構會員的作品。共同形成了獨特的指紋。
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重量
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INIS
performance
100%
design
89%
control
81%
layers
80%
devices
74%
transistors
62%
thin films
61%
applications
61%
metals
57%
oxides
56%
ferroelectric materials
50%
surfaces
50%
films
47%
voltage
44%
lasers
44%
dielectrics
44%
power
36%
substrates
36%
capacitance
36%
semiconductor materials
36%
electrodes
34%
field effect transistors
33%
motion
32%
graphene
32%
simulation
32%
fuzzy logic
29%
investigations
29%
thickness
29%
silicon
29%
plasma
29%
dynamics
29%
detection
28%
algorithms
28%
interfaces
27%
hybrids
27%
images
27%
comparative evaluations
27%
precision
27%
sensors
26%
capacitors
26%
learning
25%
robots
25%
etching
24%
fabrication
24%
disturbances
23%
traps
23%
stability
23%
mobility
23%
titanium oxides
22%
errors
21%
machining
20%
oxygen
20%
implementation
20%
tools
20%
doped materials
20%
signals
19%
reliability
19%
glass
18%
speed
18%
data
18%
deposition
17%
positioning
17%
energy
17%
efficiency
17%
microstructure
17%
hafnium oxides
16%
hafnium
16%
annealing
16%
evaluation
16%
engineering
16%
distribution
16%
processing
16%
cost
16%
polarization
15%
actuators
15%
optimization
15%
range
15%
manipulators
15%
mosfet
15%
control systems
14%
diamonds
14%
grinding
14%
accuracy
14%
values
13%
zinc oxides
13%
light emitting diodes
13%
width
13%
tantalum nitrides
13%
leakage current
13%
tin oxides
12%
color
12%
nanostructures
12%
planning
12%
pulses
12%
germanium silicides
12%
randomness
12%
length
12%
ultraviolet radiation
12%
aluminium oxides
12%
increasing
12%
Material Science
Temperature
74%
Devices
74%
Dielectric Material
52%
Oxide
45%
Ferroelectric Material
45%
Thin-Film Transistor
42%
Capacitance
40%
Laser
39%
Electrode
38%
Surface
37%
Graphene
31%
Metal-Oxide-Semiconductor Field-Effect Transistor
28%
Thin Films
28%
Electrical Property
27%
Capacitor
27%
Metal
27%
Transistor
24%
Silicon
24%
Field Effect Transistor
23%
Hafnium
22%
Density
21%
Microstructure
20%
Oxide Semiconductor
19%
Metal Oxide
18%
Glass
16%
Composite Material
15%
Material
15%
Film
14%
Aluminum Oxide
14%
Durability
14%
Tin Oxide
14%
Sensor
13%
Strain
12%
Titanium Dioxide
12%
Titanium Oxide
12%
Annealing
12%
Nitride Compound
12%
Characterization
10%
Electronic Circuit
10%
Zirconia
10%
Light-Emitting Diode
10%
Gas
10%
Particle
9%
Thermal Conductivity
9%
Zinc Oxide
9%
X-Ray Diffraction
8%
Laser Ablation
8%
Machining
8%
Oxygen Vacancy
8%
Powder
8%
Nanocrystalline Material
8%
Indium
8%
Diamond
8%
Flexible Substrate
8%
Type Metal
8%
Amorphous Material
8%
Polyimide
7%
Nitriding
7%
Switch
7%
Wettability
7%
Ferrite
7%
Surface Active Agent
6%
Bending
6%
Resistive Random-Access Memory
6%
Tungsten
6%
Hot Carrier
6%
Surface Roughness
6%
Copper
6%
Color
6%
Scanning Electron Microscopy
6%
Optical Property
6%
Gallium
6%
Magnetic Property
6%
Thermoelectrics
6%
Silicate
5%
Electrodeposition
5%
Gas Sensor
5%
Crystalline Material
5%
Mechanical Property
5%
Graphene Oxide
5%
Electrical Breakdown
5%
Fiber
5%
Electrochromics
5%
Nanowire
5%
Coating
5%
ZnO
5%
Display Device
5%
Micromachining
5%
Physical Property
5%
Irradiation
5%
Crystallization
5%
Engineering
Performance
23%
Experimental Result
19%
Gate Dielectric
13%
Dielectrics
12%
Surfaces
12%
Applications
11%
Electric Potential
9%
Mechanisms
9%
Fabrication
8%
Positioner
8%
Algorithm
8%
Oxide Thickness
7%
Experiments
7%
Estimation
7%
Substrates
7%
Images
7%
Hybrid
7%
Density
7%
Development
6%
Demonstrates
6%
Reliability
6%
Plasma
6%
Models
6%
Flexure
6%
Simulation Result
6%
Grinding (Machining)
5%
Temperature
5%
High Precision
5%
Capacitance
5%
Degree of Freedom
5%
Permanent Magnet
5%
Actuators
5%
Piezoelectric
5%
Resistive
5%
Diamond
5%
Enhancement
5%
Simulation
5%
Switching
5%
Picosecond Laser
5%
Roughness
5%