Vertical SCR structure for on-chip ESD protection in nanoscale CMOS technology

Chun-Yu Lin, Pin Hsin Chang, Rong Kun Chang, Ming Dou Ker, Wen Tai Wang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A vertical silicon-controlled rectifier (SCR) structure utilizing ESD implantation layer was proposed and implemented in nanoscale CMOS technology. Compared with the traditional SCR structure, the proposed structure has lower trigger voltage and high enough ESD protection capability. Therefore, the proposed structure was suitable for ESD protection in nanoscale CMOS process.

Original languageEnglish
Title of host publicationProceedings of the 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages255-258
Number of pages4
ISBN (Electronic)9781479999286, 9781479999286
DOIs
Publication statusPublished - 2015 Aug 25
Event22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015 - Hsinchu, Taiwan
Duration: 2015 Jun 292015 Jul 2

Publication series

NameProceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
Volume2015-August

Other

Other22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015
CountryTaiwan
CityHsinchu
Period15/6/2915/7/2

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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  • Cite this

    Lin, C-Y., Chang, P. H., Chang, R. K., Ker, M. D., & Wang, W. T. (2015). Vertical SCR structure for on-chip ESD protection in nanoscale CMOS technology. In Proceedings of the 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015 (pp. 255-258). [7224380] (Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA; Vol. 2015-August). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IPFA.2015.7224380