Transport properties of CrO₂ (110) films grown on TiO ₂ buffered Si substrates by chemical vapor deposition

INIS

• transport 100%
• films 100%
• substrates 100%
• chemical vapor deposition 100%
• titanium oxides 100%
• temperature dependence 50%
• epitaxy 50%
• range 25%
• layers 25%
• zones 25%
• oxygen 25%
• oxidation 25%
• lasers 25%
• wavelengths 25%
• scattering 25%
• precursor 25%
• magnetization 25%
• curie temperature 25%
• tin 25%
• furnaces 25%
• spin flip 25%
• rutile 25%

Physics

• Substrates 100%
• Transport Properties 100%
• Temperature 50%
• Electrical Resistivity 50%
• Region 50%
• Oxygen 50%
• Magnetization 50%
• Magnetic Measurement 50%
• Curie Temperature 50%
• Plane 50%
• Temperature Dependence 50%
• Oxidation 50%
• Black Hole Spin-Flip 50%
• Rutile 50%
• Pulsed Laser 50%

Material Science

• Temperature 100%
• Chemical Vapor Deposition 100%
• Titanium Oxide 100%
• Curie Temperature 50%
• Laser 50%
• Oxidation Reaction 50%
• Electrical Resistivity 50%
• Titanium Dioxide 50%
• Epitaxial Film 50%