"Top-down placement for hierarchical layout system," Proceedings of Electron Device and Materials Symposium

Kuo-En Chang, W.S. Feng

Research output: Contribution to conferencePaper

Original languageEnglish
Pages45-50
Publication statusPublished - 1986 Aug

Cite this

"Top-down placement for hierarchical layout system," Proceedings of Electron Device and Materials Symposium. / Chang, Kuo-En; Feng, W.S.

1986. 45-50.

Research output: Contribution to conferencePaper

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title = "{"}Top-down placement for hierarchical layout system,{"} Proceedings of Electron Device and Materials Symposium",
author = "Kuo-En Chang and W.S. Feng",
year = "1986",
month = "8",
language = "English",
pages = "45--50",

}

TY - CONF

T1 - "Top-down placement for hierarchical layout system," Proceedings of Electron Device and Materials Symposium

AU - Chang, Kuo-En

AU - Feng, W.S.

PY - 1986/8

Y1 - 1986/8

M3 - Paper

SP - 45

EP - 50

ER -