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Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric
C. C. Yeo*, B. J. Cho, M. H. Lee, C. W. Liu, K. J. Choi, T. W. Lee
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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(Scopus)