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Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric

  • C. C. Yeo*
  • , B. J. Cho
  • , M. H. Lee
  • , C. W. Liu
  • , K. J. Choi
  • , T. W. Lee
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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