Thermal reactions on the Cl-terminated SiGe(1 0 0) surface

Meng Wen Wu, Shiang Yuan Pan, Wei Hsiu Hung, Deng Sung Lin

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Abstract

Synchrotron radiation photoemission spectroscopy was used to investigate thermal reactions on the Cl-terminated SiGe(1 0 0)-2 × 1 surface. Populations of GeCl and SiCl surface species during thermal annealing are monitored by measuring the intensities of their corresponding Ge 3d, Si 2p and Cl 2p core level components. Experimental results indicate that the initially clean SiGe alloy surface is dominated by Ge-Ge and Ge-Si dimers, and that, after Cl2 adsorption, thermodynamic forces drive Si in the subsurface region to replace Ge in the GeCl species. Consequently, chlorine desorbs in the form of SiCl2 above ∼700 K, leading to etching of Si.

Original languageEnglish
Pages (from-to)295-299
Number of pages5
JournalSurface Science
Volume507-510
DOIs
Publication statusPublished - 2002 Jun 1

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Keywords

  • Chlorine
  • Germanium
  • Photoemission (total yield)
  • Silicon
  • Thermal desorption

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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