Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

K. C. Chiang; C. C. Huang; H. C. Pan; C. N. Hsiao; J. W. Lin; I. J. Hsieh; C. H. Cheng; C. P. Chou; A. Chin; H. L. Hwang; S. P. McAlister

doi:10.1149/1.2422874

Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

K. C. Chiang^*
, C. C. Huang
, H. C. Pan
, C. N. Hsiao
, J. W. Lin
, I. J. Hsieh
, C. H. Cheng
, C. P. Chou
, A. Chin
, H. L. Hwang
, S. P. McAlister

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

Original language	English
Pages (from-to)	G54-G57
Journal	Journal of the Electrochemical Society
Volume	154
Issue number	3
DOIs	https://doi.org/10.1149/1.2422874
Publication status	Published - 2007
Externally published	Yes

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Renewable Energy, Sustainability and the Environment
Surfaces, Coatings and Films
Electrochemistry
Materials Chemistry

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10.1149/1.2422874

Cite this

Chiang, K. C., Huang, C. C., Pan, H. C., Hsiao, C. N., Lin, J. W., Hsieh, I. J., Cheng, C. H., Chou, C. P., Chin, A., Hwang, H. L., & McAlister, S. P. (2007). Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors. Journal of the Electrochemical Society, 154(3), G54-G57. https://doi.org/10.1149/1.2422874

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title = "Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors",

abstract = "An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.",

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year = "2007",

doi = "10.1149/1.2422874",

language = "English",

volume = "154",

pages = "G54--G57",

journal = "Journal of the Electrochemical Society",

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T1 - Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

AU - Chiang, K. C.

AU - Huang, C. C.

AU - Pan, H. C.

AU - Hsiao, C. N.

AU - Lin, J. W.

AU - Hsieh, I. J.

AU - Cheng, C. H.

AU - Chou, C. P.

AU - Chin, A.

AU - Hwang, H. L.

AU - McAlister, S. P.

PY - 2007

Y1 - 2007

N2 - An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

AB - An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

UR - https://www.scopus.com/pages/publications/33846975485

UR - https://www.scopus.com/pages/publications/33846975485#tab=citedBy

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SP - G54-G57

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

IS - 3

ER -

Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

Abstract

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ASJC Scopus subject areas

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