Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

K. C. Chiang, C. C. Huang, H. C. Pan, C. N. Hsiao, J. W. Lin, I. J. Hsieh, Chun-Hu Cheng, C. P. Chou, A. Chin, H. L. Hwang, S. P. McAlister

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume154
Issue number3
DOIs
Publication statusPublished - 2007 Feb 19

Fingerprint

Leakage currents
laminates
capacitors
Capacitors
leakage
Metals
insulators
Electrodes
electrodes
metals
Laminates
linearity
integrated circuits
Integrated circuits
radio frequencies
Multilayers
Energy gap
analogs
Electric potential
electric potential

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors. / Chiang, K. C.; Huang, C. C.; Pan, H. C.; Hsiao, C. N.; Lin, J. W.; Hsieh, I. J.; Cheng, Chun-Hu; Chou, C. P.; Chin, A.; Hwang, H. L.; McAlister, S. P.

In: Journal of the Electrochemical Society, Vol. 154, No. 3, 19.02.2007.

Research output: Contribution to journalArticle

Chiang, KC, Huang, CC, Pan, HC, Hsiao, CN, Lin, JW, Hsieh, IJ, Cheng, C-H, Chou, CP, Chin, A, Hwang, HL & McAlister, SP 2007, 'Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors', Journal of the Electrochemical Society, vol. 154, no. 3. https://doi.org/10.1149/1.2422874
Chiang, K. C. ; Huang, C. C. ; Pan, H. C. ; Hsiao, C. N. ; Lin, J. W. ; Hsieh, I. J. ; Cheng, Chun-Hu ; Chou, C. P. ; Chin, A. ; Hwang, H. L. ; McAlister, S. P. / Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors. In: Journal of the Electrochemical Society. 2007 ; Vol. 154, No. 3.
@article{73b7ccd91d3440b499e232b41d808f0c,
title = "Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors",
abstract = "An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.",
author = "Chiang, {K. C.} and Huang, {C. C.} and Pan, {H. C.} and Hsiao, {C. N.} and Lin, {J. W.} and Hsieh, {I. J.} and Chun-Hu Cheng and Chou, {C. P.} and A. Chin and Hwang, {H. L.} and McAlister, {S. P.}",
year = "2007",
month = "2",
day = "19",
doi = "10.1149/1.2422874",
language = "English",
volume = "154",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "3",

}

TY - JOUR

T1 - Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

AU - Chiang, K. C.

AU - Huang, C. C.

AU - Pan, H. C.

AU - Hsiao, C. N.

AU - Lin, J. W.

AU - Hsieh, I. J.

AU - Cheng, Chun-Hu

AU - Chou, C. P.

AU - Chin, A.

AU - Hwang, H. L.

AU - McAlister, S. P.

PY - 2007/2/19

Y1 - 2007/2/19

N2 - An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

AB - An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

UR - http://www.scopus.com/inward/record.url?scp=33846975485&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33846975485&partnerID=8YFLogxK

U2 - 10.1149/1.2422874

DO - 10.1149/1.2422874

M3 - Article

VL - 154

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 3

ER -