Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

K. C. Chiang, C. C. Huang, H. C. Pan, C. N. Hsiao, J. W. Lin, I. J. Hsieh, C. H. Cheng, C. P. Chou, A. Chin, H. L. Hwang, S. P. McAlister

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25 Citations (Scopus)

Abstract

An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

Original languageEnglish
Pages (from-to)G54-G57
JournalJournal of the Electrochemical Society
Volume154
Issue number3
DOIs
Publication statusPublished - 2007 Feb 19
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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    Chiang, K. C., Huang, C. C., Pan, H. C., Hsiao, C. N., Lin, J. W., Hsieh, I. J., Cheng, C. H., Chou, C. P., Chin, A., Hwang, H. L., & McAlister, S. P. (2007). Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors. Journal of the Electrochemical Society, 154(3), G54-G57. https://doi.org/10.1149/1.2422874