The roughness-enhanced light emission from metal-oxide-silicon light-emitting diodes using very high vacuum prebake

Min Hung Lee, Kuan Fu Chen, Chang Chi Lai, Chee Wee Liu, Woei Wu Pai, Miin Jang Chen, Ching Fuh Lin

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The oxide roughness of metal-oxide-silicon diodes can be intentionally controlled by the very high vacuum pre-bake and the growth conditions during rapid thermal oxidation. Both surface and Si/oxide interface have the similar magnitude of roughness measured by atomic force microscopy, indicating the conformal growth of oxide. At accumulation bias (positive gate bias), the holes tunnel from gate electrode to n-type Si through the ultrathin oxide, and recombine with the electrons in the accumulation region radiatively if phonon scattering and roughness scattering provide the necessary momentum. The light emission intensity increases with increasing oxide roughness. Strong electroluminescence with an external quantum efficiency of ∼ 2 × 10-6 at room temperature was observed from a rough metal-oxide-silicon tunneling diode.

Original languageEnglish
Pages (from-to)L326-L328
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume41
Issue number3 B
DOIs
Publication statusPublished - 2002 Mar 15

Keywords

  • Electroluminescence
  • Electron-hole plasma recombination
  • External quantum efficiency
  • Metal oxide silicon diode
  • Roughness

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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