The magnetic reversal study of permalloy micro domains

Y. W. Huang, C. K. Lo, Y. D. Yao, T. R. Jeng, J. J. Ju

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.

Original languageEnglish
Title of host publicationIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780376471, 9780780376472
DOIs
Publication statusPublished - 2003
Externally publishedYes
Event2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States
Duration: 2003 Mar 302003 Apr 3

Publication series

NameIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference

Other

Other2003 IEEE International Magnetics Conference, Intermag 2003
Country/TerritoryUnited States
CityBoston
Period2003/03/302003/04/03

Keywords

  • Coercive force
  • Gold
  • Insulation
  • Lithography
  • Magnetic domains
  • Magnetic force microscopy
  • Magnetic forces
  • Magnetization
  • Shape
  • Strips

ASJC Scopus subject areas

  • General Engineering

Fingerprint

Dive into the research topics of 'The magnetic reversal study of permalloy micro domains'. Together they form a unique fingerprint.

Cite this