Abstract
In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.
Original language | English |
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Title of host publication | Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Electronic) | 0780376471, 9780780376472 |
DOIs | |
Publication status | Published - 2003 Jan 1 |
Event | 2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States Duration: 2003 Mar 30 → 2003 Apr 3 |
Other
Other | 2003 IEEE International Magnetics Conference, Intermag 2003 |
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Country | United States |
City | Boston |
Period | 2003/03/30 → 2003/04/03 |
Keywords
- Coercive force
- Gold
- Insulation
- Lithography
- Magnetic domains
- Magnetic force microscopy
- Magnetic forces
- Magnetization
- Shape
- Strips
ASJC Scopus subject areas
- Engineering(all)