The magnetic reversal study of permalloy micro domains

Y. W. Huang, Chi-Kuen Lo, Y. D. Yao, T. R. Jeng, J. J. Ju

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.

Original languageEnglish
Title of host publicationIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780376471, 9780780376472
DOIs
Publication statusPublished - 2003 Jan 1
Event2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States
Duration: 2003 Mar 302003 Apr 3

Other

Other2003 IEEE International Magnetics Conference, Intermag 2003
CountryUnited States
CityBoston
Period03/3/3003/4/3

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Keywords

  • Coercive force
  • Gold
  • Insulation
  • Lithography
  • Magnetic domains
  • Magnetic force microscopy
  • Magnetic forces
  • Magnetization
  • Shape
  • Strips

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Huang, Y. W., Lo, C-K., Yao, Y. D., Jeng, T. R., & Ju, J. J. (2003). The magnetic reversal study of permalloy micro domains. In Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference [1230601] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2003.1230601