The magnetic reversal study of permalloy micro domains

Y. W. Huang; Chi-Kuen Lo; Y. D. Yao; T. R. Jeng; J. J. Ju

doi:10.1109/INTMAG.2003.1230601

The magnetic reversal study of permalloy micro domains

Y. W. Huang, Chi-Kuen Lo, Y. D. Yao, T. R. Jeng, J. J. Ju

Department of Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.

Original language	English
Title of host publication	Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	0780376471, 9780780376472
DOIs	https://doi.org/10.1109/INTMAG.2003.1230601
Publication status	Published - 2003 Jan 1
Event	2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States Duration: 2003 Mar 30 → 2003 Apr 3

Other

Other	2003 IEEE International Magnetics Conference, Intermag 2003
Country	United States
City	Boston
Period	03/3/30 → 03/4/3

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Keywords

Coercive force
Gold
Insulation
Lithography
Magnetic domains
Magnetic force microscopy
Magnetic forces
Magnetization
Shape
Strips

ASJC Scopus subject areas

Engineering(all)

Cite this

Huang, Y. W., Lo, C-K., Yao, Y. D., Jeng, T. R., & Ju, J. J. (2003). The magnetic reversal study of permalloy micro domains. In Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference [1230601] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2003.1230601

Huang, YW, Lo, C-K, Yao, YD, Jeng, TR & Ju, JJ 2003, The magnetic reversal study of permalloy micro domains. in Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference., 1230601, Institute of Electrical and Electronics Engineers Inc., 2003 IEEE International Magnetics Conference, Intermag 2003, Boston, United States, 03/3/30. https://doi.org/10.1109/INTMAG.2003.1230601

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AU - Ju, J. J.

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AB - In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.

KW - Coercive force

KW - Gold

KW - Insulation

KW - Lithography

KW - Magnetic domains

KW - Magnetic force microscopy

KW - Magnetic forces

KW - Magnetization

KW - Shape

KW - Strips

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DO - 10.1109/INTMAG.2003.1230601

M3 - Conference contribution

AN - SCOPUS:84949491204

BT - Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2003 IEEE International Magnetics Conference, Intermag 2003

Y2 - 30 March 2003 through 3 April 2003

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Access to Document

10.1109/INTMAG.2003.1230601