The influence of physical and electrical properties in HfO2 thin film with different lanthanum doping position

P. C. Juan, Y. S. Chien, J. Y. Lin, C. P. Cheng, C. H. Liu*, H. W. Hsu, H. W. Chen, H. S. Huang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Material Science