The influence of lanthanum doping position in ultra-thin HfO2 films for high-k gate dielectrics

Chuan-Hsi Liu, P. C. Juan, J. Y. Lin

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Fingerprint Dive into the research topics of 'The influence of lanthanum doping position in ultra-thin HfO<sub>2</sub> films for high-k gate dielectrics'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy