The enhancement of MOSFET electric performance through strain engineering by refilled sige as Source and Drain

Hsin Chia Yang, Chao Wang Li, Wen Shiang Liao, Chong Kuan Du, Mu Chun Wang*, Jie Min Yang, Chun Wei Lian, Chuan Hsi Liu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Fingerprint

Dive into the research topics of 'The enhancement of MOSFET electric performance through strain engineering by refilled sige as Source and Drain'. Together they form a unique fingerprint.

INIS

Material Science

Engineering

Chemical Engineering