The effect of sputtering parameters on the film properties of molybdenum back contact for CIGS solar cells

Peng Cheng Huang, Chia Ho Huang, Mao Yong Lin, Chia Ying Chou, Chun Yao Hsu, Chin Guo Kuo*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)


Molybdenum (Mo) thin films are widely used as a back contact for CIGS-based solar cells. This paper determines the optimal settings for the sputtering parameters for an Mo thin film prepared on soda lime glass substrates, using direct current (dc) magnetron sputtering, with a metal Mo target, in an argon gas environment. A Taguchi method with an L9 orthogonal array, the signal-to-noise ratio, and an analysis of variances is used to determine the performance characteristics of the coating operation. The main sputtering parameters, such as working pressure (mTorr), dc power (W), and substrate temperature (°C), are optimized with respect to the structural features, surface morphology, and electrical properties of the Mo films. An adhesive tape test is performed on each film to determine the adhesion strength of the films. The experimental results show that the working pressure has the dominant effect on electrical resistivity and reflectance. The intensity of the main peak (110) for the Mo film increases and the full width at half maximum decreases gradually as the sputtering power is increased. Additionally, the application of an Mo bilayer demonstrates good adherence and low resistivity.

Original languageEnglish
Article number390824
JournalInternational Journal of Photoenergy
Publication statusPublished - 2013

ASJC Scopus subject areas

  • General Chemistry
  • Atomic and Molecular Physics, and Optics
  • Renewable Energy, Sustainability and the Environment
  • General Materials Science


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