Abstract
This study investigates structural modifications of the conventional TFT, which is suffers from the short-channel effect in advanced applications. An ideal body-block poly-Si thin-film transistor is successfully fabricated for the first time at a level that achieves high performance characteristics. The output characteristics of the body-block TFT, for instance, the low output conductance in the saturation area and high breakdown voltage, achieve an outstanding improvements compared to a conventional TFT. The poly-Si thin-film treatments of the body-block TFT with NH3 diffusion or body implantation, and their corresponding performance effects, have also been investigated and discussed in depth.
Original language | English |
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Pages (from-to) | 1056-1061 |
Number of pages | 6 |
Journal | Solid-State Electronics |
Volume | 51 |
Issue number | 7 |
DOIs | |
Publication status | Published - 2007 Jul 1 |
Keywords
- Drain induced barrier lowing (DIBL)
- Short-channel effect (SCE)
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics