Synthesis and electron field emission properties of nanodiamond films

Y. C. Lee; S. J. Lin; C. T. Chia; H. F. Cheng; I. N. Lin

doi:10.1016/j.diamond.2004.06.021

Synthesis and electron field emission properties of nanodiamond films

Y. C. Lee, S. J. Lin, C. T. Chia, H. F. Cheng, I. N. Lin^*

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Conference article › peer-review

22 Citations (Scopus)

Abstract

Effects of CH₄/H₂ ratio and bias voltage of the microwave plasma-enhanced chemical vapor deposition (MPE-CVD) process on the nucleation behavior and associated characteristics of nanodiamonds were investigated, While the scanning electron microscopy (SEM) microstructure and Raman crystal structure of the films insignificantly vary with CH ₄/H₂ ratio and bias voltage, electron field emission properties of the materials markedly change with these deposition parameters. The predominating factor modifying the electron field emission properties of the nanodiamond films is presumed to be the increase in the proportion of sp²-bonded grain boundaries when the grain size of the nanodiamond films decreases. Between these two major factors, the bias voltage shows more prominent effects on modifying the granular structure of the nanodiamonds than the CH₄/H₂ ratio does. The best electron field emission properties attainable are J_e=500 μA/cm² at 20 V/μm and E₀=8.5 V/μm.

Original language	English
Pages (from-to)	2100-2104
Number of pages	5
Journal	Diamond and Related Materials
Volume	13
Issue number	11-12
DOIs	https://doi.org/10.1016/j.diamond.2004.06.021
Publication status	Published - 2004 Nov
Event	Proceedings of the 9th International Conference on New Diamond - Tokyo, Japan Duration: 2004 Mar 26 → 2004 Mar 29

Keywords

BEG
BEN
Electron field emission
Nanodiamond

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
General Chemistry
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/j.diamond.2004.06.021

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@article{7b56730bc31d468d8ef807e8a401a37b,

title = "Synthesis and electron field emission properties of nanodiamond films",

abstract = "Effects of CH4/H2 ratio and bias voltage of the microwave plasma-enhanced chemical vapor deposition (MPE-CVD) process on the nucleation behavior and associated characteristics of nanodiamonds were investigated, While the scanning electron microscopy (SEM) microstructure and Raman crystal structure of the films insignificantly vary with CH 4/H2 ratio and bias voltage, electron field emission properties of the materials markedly change with these deposition parameters. The predominating factor modifying the electron field emission properties of the nanodiamond films is presumed to be the increase in the proportion of sp2-bonded grain boundaries when the grain size of the nanodiamond films decreases. Between these two major factors, the bias voltage shows more prominent effects on modifying the granular structure of the nanodiamonds than the CH4/H2 ratio does. The best electron field emission properties attainable are Je=500 μA/cm2 at 20 V/μm and E0=8.5 V/μm.",

keywords = "BEG, BEN, Electron field emission, Nanodiamond",

author = "Lee, {Y. C.} and Lin, {S. J.} and Chia, {C. T.} and Cheng, {H. F.} and Lin, {I. N.}",

note = "Funding Information: The authors would like to thank the National Science Council, ROC for supporting this research through project no. NSC 92-2216-E-032-005.; Proceedings of the 9th International Conference on New Diamond ; Conference date: 26-03-2004 Through 29-03-2004",

year = "2004",

month = nov,

doi = "10.1016/j.diamond.2004.06.021",

language = "English",

volume = "13",

pages = "2100--2104",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier BV",

number = "11-12",

}

TY - JOUR

T1 - Synthesis and electron field emission properties of nanodiamond films

AU - Lee, Y. C.

AU - Lin, S. J.

AU - Chia, C. T.

AU - Cheng, H. F.

AU - Lin, I. N.

N1 - Funding Information: The authors would like to thank the National Science Council, ROC for supporting this research through project no. NSC 92-2216-E-032-005.

PY - 2004/11

Y1 - 2004/11

N2 - Effects of CH4/H2 ratio and bias voltage of the microwave plasma-enhanced chemical vapor deposition (MPE-CVD) process on the nucleation behavior and associated characteristics of nanodiamonds were investigated, While the scanning electron microscopy (SEM) microstructure and Raman crystal structure of the films insignificantly vary with CH 4/H2 ratio and bias voltage, electron field emission properties of the materials markedly change with these deposition parameters. The predominating factor modifying the electron field emission properties of the nanodiamond films is presumed to be the increase in the proportion of sp2-bonded grain boundaries when the grain size of the nanodiamond films decreases. Between these two major factors, the bias voltage shows more prominent effects on modifying the granular structure of the nanodiamonds than the CH4/H2 ratio does. The best electron field emission properties attainable are Je=500 μA/cm2 at 20 V/μm and E0=8.5 V/μm.

AB - Effects of CH4/H2 ratio and bias voltage of the microwave plasma-enhanced chemical vapor deposition (MPE-CVD) process on the nucleation behavior and associated characteristics of nanodiamonds were investigated, While the scanning electron microscopy (SEM) microstructure and Raman crystal structure of the films insignificantly vary with CH 4/H2 ratio and bias voltage, electron field emission properties of the materials markedly change with these deposition parameters. The predominating factor modifying the electron field emission properties of the nanodiamond films is presumed to be the increase in the proportion of sp2-bonded grain boundaries when the grain size of the nanodiamond films decreases. Between these two major factors, the bias voltage shows more prominent effects on modifying the granular structure of the nanodiamonds than the CH4/H2 ratio does. The best electron field emission properties attainable are Je=500 μA/cm2 at 20 V/μm and E0=8.5 V/μm.

KW - BEG

KW - BEN

KW - Electron field emission

KW - Nanodiamond

UR - http://www.scopus.com/inward/record.url?scp=7544230475&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=7544230475&partnerID=8YFLogxK

U2 - 10.1016/j.diamond.2004.06.021

DO - 10.1016/j.diamond.2004.06.021

M3 - Conference article

AN - SCOPUS:7544230475

SN - 0925-9635

VL - 13

SP - 2100

EP - 2104

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 11-12

T2 - Proceedings of the 9th International Conference on New Diamond

Y2 - 26 March 2004 through 29 March 2004

ER -

Synthesis and electron field emission properties of nanodiamond films

Abstract

Keywords

ASJC Scopus subject areas

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