Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications

Zhe Chuan Feng; Li Chi Cheng; Chu Wan Huang; Ying Lang Wang; T. R. Yang

doi:10.1109/SMELEC.2006.380785

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications

Zhe Chuan Feng^*, Li Chi Cheng, Chu Wan Huang, Ying Lang Wang, T. R. Yang

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy techniques have been employed for the investigation on Si-based layer structures for sub-micron Si-IC Applications. The high energy synchrotron radiation light sources have produced plenty of X-ray lines with high index diffraction and strong X-ray photoelectron emissions. The useful information will increase our understanding of these materials which are applied extensively to the semiconductor industry.

Original language	English
Title of host publication	ICSE 2006
Subtitle of host publication	2006 IEEE International Conference on Semiconductor Electronics, Proceedings
Pages	981-984
Number of pages	4
DOIs	https://doi.org/10.1109/SMELEC.2006.380785
Publication status	Published - 2006
Externally published	Yes
Event	2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006 - Kuala Lumpur, Malaysia Duration: 2006 Nov 29 → 2006 Dec 1

Publication series

Name	IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE

Conference

Conference	2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006
Country/Territory	Malaysia
City	Kuala Lumpur
Period	2006/11/29 → 2006/12/01

ASJC Scopus subject areas

Engineering(all)

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10.1109/SMELEC.2006.380785

Cite this

Feng, Z. C., Cheng, L. C., Huang, C. W., Wang, Y. L., & Yang, T. R. (2006). Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. In ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings (pp. 981-984). [4266768] (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE). https://doi.org/10.1109/SMELEC.2006.380785

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. / Feng, Zhe Chuan; Cheng, Li Chi; Huang, Chu Wan et al.
ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings. 2006. p. 981-984 4266768 (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Feng, ZC, Cheng, LC, Huang, CW, Wang, YL & Yang, TR 2006, Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. in ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings., 4266768, IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE, pp. 981-984, 2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006, Kuala Lumpur, Malaysia, 2006/11/29. https://doi.org/10.1109/SMELEC.2006.380785

Feng ZC, Cheng LC, Huang CW, Wang YL, Yang TR. Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. In ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings. 2006. p. 981-984. 4266768. (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE). doi: 10.1109/SMELEC.2006.380785

Feng, Zhe Chuan ; Cheng, Li Chi ; Huang, Chu Wan et al. / Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings. 2006. pp. 981-984 (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE).

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abstract = "Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy techniques have been employed for the investigation on Si-based layer structures for sub-micron Si-IC Applications. The high energy synchrotron radiation light sources have produced plenty of X-ray lines with high index diffraction and strong X-ray photoelectron emissions. The useful information will increase our understanding of these materials which are applied extensively to the semiconductor industry.",

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Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications

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