Study of Silicide Blocking for GGNMOS Performance and Turn-On Time in CMOS Process

Er Wen Chien, Hao En Cheng, Chun Yu Lin*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In order to minimize the occurrence of ESD damage in integrated circuits, it is crucial to design protective circuits that can effectively prevent ESD destruction. One approach that has been widely adopted is the utilization of NMOS-based ESD protection circuits. Among the various NMOS-based ESD protection circuits, the gate-grounded NMOS (GGNMOS) has emerged as a prominent choice. This study focuses on utilizing the GGNMOS as a benchmark for ESD protection to enhance its performance.

Original languageEnglish
Title of host publication11th IEEE International Conference on Consumer Electronics - Taiwan, ICCE-Taiwan 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages787-788
Number of pages2
ISBN (Electronic)9798350386844
DOIs
Publication statusPublished - 2024
Externally publishedYes
Event11th IEEE International Conference on Consumer Electronics - Taiwan, ICCE-Taiwan 2024 - Taichung, Taiwan
Duration: 2024 Jul 92024 Jul 11

Publication series

Name11th IEEE International Conference on Consumer Electronics - Taiwan, ICCE-Taiwan 2024

Conference

Conference11th IEEE International Conference on Consumer Electronics - Taiwan, ICCE-Taiwan 2024
Country/TerritoryTaiwan
CityTaichung
Period2024/07/092024/07/11

ASJC Scopus subject areas

  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Media Technology
  • Modelling and Simulation
  • Instrumentation

Fingerprint

Dive into the research topics of 'Study of Silicide Blocking for GGNMOS Performance and Turn-On Time in CMOS Process'. Together they form a unique fingerprint.

Cite this