Study of nanopattern forming with chemical coatings for silicon-based stamp in nanoimprint process

Tien Li Chang, Jung Chang Wang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The aim of this study is to present a silane molecule self-assembled monolayer (octadecyltrimethoxysilane (CH3(CH2) 17Si(OCH3)3): OTS-SAM) as anti-adhesive coatings to improve of silicon-based stamps for the developed nanoimprint lithography (NIL). In this work, the nanostructures of stamps are fabricated by electron-beam lithography (EBL). The diameters of period pillar nanopatterns on the silicon-based stamps are 150 nm and 200 nm, receptively. The influence of silicon-based stamp substrate can be investigated by contact angle measurement after modifying the chemical coating treatment for imprinted thin polymethyl methacrylate (PMMA) films. To control the forming of fabricated nanopatterns, the simulation can be done to obtain the effects of patterning distortion during this NIL process. In addition, the study employs atomic force microscopy (AFM) to obtain a simultaneous observation for the morphologies of silicon-based and imprinted PMMA polymer nanostructures interface. The results indicate an over 95 % improvement for silicon-based nanopatterns with the anti-adhesive properties in NIL process.

Original languageEnglish
Title of host publication2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings
Pages795-798
Number of pages4
DOIs
Publication statusPublished - 2007 Dec 1
Externally publishedYes
Event2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007 - Hong Kong, China
Duration: 2007 Aug 22007 Aug 5

Publication series

Name2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings

Other

Other2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007
CountryChina
CityHong Kong
Period07/8/207/8/5

Keywords

  • Anti-adhesive coating treatment
  • Nanoimprint lithography
  • OTS-SAM
  • Silicon-based stamp

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

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    Chang, T. L., & Wang, J. C. (2007). Study of nanopattern forming with chemical coatings for silicon-based stamp in nanoimprint process. In 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings (pp. 795-798). [4601305] (2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings). https://doi.org/10.1109/NANO.2007.4601305