Structures and magnetic properties of Co and CoFe films prepared by magnetron sputtering

C. H. Lin, W. H. Chen, Jyh-Shen Tsay, I. T. Hong, C. H. Chiu, H. S. Huang

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Structures and magnetic properties of Co and CoFe films on Si(100) have been investigated by employing scanning tunneling microscopy, atomic force microscopy, and magneto-optic Kerr effect techniques. As the film thickness increases, Co or CoFe clusters with different sizes are observed. As the film thickness increases below 20 nm, the size of the metal clusters decreases. For thicker films, the surface roughness increases monotonously by increasing the thickness. The easy axis of magnetization for both Co/Si(100) and CoFe/Si(100) prefers to be in the surface plane. By deposition of the Co or CoFe overlayers, the evolution of the longitudinal coercive force shows similar trend to the surface roughness. Minimum coercive force coincides with the smallest roughness of the film. For a film with greater roughness, the observation of larger coercive force could be explained by the impediment of the propagation of domain wall motion by defects of the films. At a higher deposition rate, Co islands in triangle shapes with an edge length around 100 nm are observed. This nanostructure shows an hcp-Co with the c axis parallel to the surface plane and is observed to be able to stabilize the coercive force for Co/Si(100) films.

Original languageEnglish
Pages (from-to)8379-8383
Number of pages5
JournalThin Solid Films
Volume519
Issue number23
DOIs
Publication statusPublished - 2011 Sep 30

Fingerprint

Magnetron sputtering
Magnetic properties
magnetron sputtering
Coercive force
magnetic properties
Surface roughness
Film thickness
surface roughness
film thickness
roughness
Magnetooptical effects
Domain walls
magneto-optics
Scanning tunneling microscopy
metal clusters
Kerr effects
Deposition rates
Thick films
triangles
thick films

Keywords

  • CoFe
  • Cobalt
  • Magneto-optic Kerr effect
  • Magnetron sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Structures and magnetic properties of Co and CoFe films prepared by magnetron sputtering. / Lin, C. H.; Chen, W. H.; Tsay, Jyh-Shen; Hong, I. T.; Chiu, C. H.; Huang, H. S.

In: Thin Solid Films, Vol. 519, No. 23, 30.09.2011, p. 8379-8383.

Research output: Contribution to journalArticle

Lin, C. H. ; Chen, W. H. ; Tsay, Jyh-Shen ; Hong, I. T. ; Chiu, C. H. ; Huang, H. S. / Structures and magnetic properties of Co and CoFe films prepared by magnetron sputtering. In: Thin Solid Films. 2011 ; Vol. 519, No. 23. pp. 8379-8383.
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