Structural properties of ultra-thin Y2O3 gate dielectrics studied by X-Ray Diffraction (XRD) and X-Ray Photoelectron Spectroscopy (XPS)

Chuan Hsi Liu*, Pi Chun Juan, Chin Pao Cheng, Guan Ting Lai, Huan Lee, Yi Kuan Chen, Yu Wei Liu, Chih Wei Hsu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Structural properties of ultra-thin Y2O3 gate dielectrics studied by X-Ray Diffraction (XRD) and X-Ray Photoelectron Spectroscopy (XPS)'. Together they form a unique fingerprint.

Material Science

Physics

INIS