Structural differences between deuterated and hydrogenated silicon nitride/oxynitride

An Shih, Shin Hung Yeh, Si Chen Lee, T. R. Yang

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Hydrogenated and deuterated silicon nitride (a-SiNx:H and a-SiNx :D) and silicon oxynitride (a-SiOxNy, :H and a-SiOxNy :D) films are prepared by plasma-enhanced chemical vapor deposition. Their transmission and photoluminescence spectra were measured. Both the photoluminescence and transmission spectra show that the deuterated films have higher energy gaps than those of the hydrogenated films in the same growth condition. The infrared absorption spectra of these samples are identified and compared in detail. From the infrared spectra, the interaction between N-D bond rocking vibration and Si-N bond stretching vibration is observed, which pushes N-D bond rocking vibration to a higher energy. It is also observed that the refractive index of deuterated film is lower than the hydrogenated film in the same growth condition due to its lower density.

Original languageEnglish
Pages (from-to)5355-5361
Number of pages7
JournalJournal of Applied Physics
Volume89
Issue number10
DOIs
Publication statusPublished - 2001 May 15

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oxynitrides
silicon nitrides
vibration
infrared spectra
photoluminescence
infrared absorption
vapor deposition
refractivity
absorption spectra
silicon
interactions
energy

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Structural differences between deuterated and hydrogenated silicon nitride/oxynitride. / Shih, An; Yeh, Shin Hung; Lee, Si Chen; Yang, T. R.

In: Journal of Applied Physics, Vol. 89, No. 10, 15.05.2001, p. 5355-5361.

Research output: Contribution to journalArticle

Shih, An ; Yeh, Shin Hung ; Lee, Si Chen ; Yang, T. R. / Structural differences between deuterated and hydrogenated silicon nitride/oxynitride. In: Journal of Applied Physics. 2001 ; Vol. 89, No. 10. pp. 5355-5361.
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