Strain-induced growth of SiO2 dots by liquid phase deposition

C. W. Liu, B. C. Hsu, K. F. Chen, Min-Hung Lee, C. R. Shie, Pang Shiu Chen

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    Liquid phase deposition method was used to deposit SiO2 dots on the Si cap layers of self-assembled Ge dots. The step height and base width of the dots increased with the deposition time. A metal-oxide-semiconductor photodetector with a responsivity of 0.08 mA/W at 1550 nm was also fabricated.

    Original languageEnglish
    Pages (from-to)589-591
    Number of pages3
    JournalApplied Physics Letters
    Volume82
    Issue number4
    DOIs
    Publication statusPublished - 2003 Jan 27

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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