Silicide formation at lower temperatures for cobalt and nickel on √3 x √3R30°-Ag/Si(111)

Cheng Hsun Tony Chang, Yu Ting Chow, Pei Cheng Jiang, Tsu Yi Fu, Jyh Shen Tsay*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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