Self-diffusion and dynamic behavior of atoms at step edges of iridium surfaces

Tsu-Yi Fu, Yee Ren Tzeng, Tien T. Tsong

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

Steps are an integral part of a surface. Many surface phenomena are to a very large extent affected or determined by the existence of lattice steps. We report a study of the dynamic behavior of atoms at step edges and on stepped surfaces of iridium. Diffusion of edge atoms along steps of different atomic structures, detachment or dissociation of step-edge atoms, descending and ascending motions of atoms at step edges, the upward movement of in-layer atoms, and the stable structure of nanometer-size islands have been investigated, and the activation barrier heights of various atomic processes at lattice steps have been derived. We have also derived parameters of adatom diffusion on the terrace of the Ir(113) and (331) surfaces to compare with those of ledge-atom diffusion along step edges of the Ir(111). Possible implications of the behavior of atoms at lattice steps in thin-film epitaxy are also discussed.

Original languageEnglish
Pages (from-to)5932-5939
Number of pages8
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume54
Issue number8
DOIs
Publication statusPublished - 1996 Jan 1

Fingerprint

Iridium
iridium
Atoms
atoms
Surface phenomena
Adatoms
ledges
Epitaxial growth
Crystal lattices
detachment
Chemical activation
atomic structure
epitaxy
adatoms
Thin films
activation
dissociation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Self-diffusion and dynamic behavior of atoms at step edges of iridium surfaces. / Fu, Tsu-Yi; Tzeng, Yee Ren; Tsong, Tien T.

In: Physical Review B - Condensed Matter and Materials Physics, Vol. 54, No. 8, 01.01.1996, p. 5932-5939.

Research output: Contribution to journalArticle

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